what about using photoresist?Yinxiao Li said:I am thinking about using a metal mask for BOE or HF etching because I realize that for normal photoresist, it will gradually peel off and affect my results. I don't know which metal is the best--so far, I see people use Cr/Au, Al, and Ni. Anybody knows which metal will give the best result?
Thanks. I am still looking for the best mask that prevents this underetching...leright said:I think the reason it peels is because of underetching (the HF etches underneath the resist as well, since it is an isotropic etchant). See this document for tips.
http://www.microchemicals.com/technical_information/hf_etching.pdf
The best metal mask for BOE/HF etching is typically made of niobium or tantalum, as these metals have high resistance to hydrofluoric acid and can withstand the harsh etching process.
The thickness of the metal mask for BOE/HF etching depends on the specific etching process and the desired etch depth. Generally, the mask should be thick enough to withstand the etching process and maintain its structural integrity.
Yes, a metal mask can be reused for multiple BOE/HF etching processes as long as it is properly cleaned and maintained. However, over time, the mask may wear down and need to be replaced.
The right metal mask for BOE/HF etching will depend on the specific etching process, the materials being etched, and the desired etch depth. It is important to consult with experts in the field to determine the best mask for your specific needs.
Yes, it is important to take proper safety precautions when handling a metal mask for BOE/HF etching. This may include using protective gear, such as gloves and goggles, and working in a well-ventilated area to avoid exposure to any hazardous chemicals.